发明名称 DISPOSITIVO A SEMICONDUTTORE E PROCEDIMENTO PER LA SUA FABBRICAZIONE
摘要 A semiconductor device according to one embodiment having a first region comprising a first dopant type, a second region adjacent the first region haivng a second dopant type and a channel region. There is a third region segregated from the channel region having a second dopant type, wherein the third region substantially coincides with the second region.
申请公布号 ITMI20112275(A1) 申请公布日期 2012.06.18
申请号 IT2011MI02275 申请日期 2011.12.15
申请人 GENERAL ELECTRIC COMPANY 发明人 ARTHUR STEPHEN DALEY;LOSEE PETER ALMERN;MATOCHA KEVIN SEAN;STUM ZACHARY MATTHEW
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