发明名称 |
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER. |
摘要 |
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder. |
申请公布号 |
NL2007768(A) |
申请公布日期 |
2012.06.18 |
申请号 |
NL20112007768 |
申请日期 |
2011.11.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAFARRE RAYMOND;TEN KATE NICOLAAS;DZIOMKINA NINA;KARADE YOGESH |
分类号 |
G03F7/20;H01L21/683 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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