| 摘要 |
PURPOSE: A manufacturing method of silica-titania dioxide hollow structure nanoparticle is provided to manufacture simple and economic silica - titanium dioxide hollow structure nanoparticle by an ultrasonic wave induced etching-redeposition method without using a surfactant. CONSTITUTION: The manufacturing method of silica-titania dioxide hollow structure nanoparticle includes following steps.(i) A silica / titania dioxide core-shell nanoparticle is dispersed into an aqueous solution.(ii) A base is introduced to the core-shell nanoparticle aqueous solution. A basic solution is created.(iii) The ultrasonic wave is added to the basic core-shell nanoparticle aqueous solution. The hollow structure is induced.(iv) A centrifuge is used to collect the silica - titania dioxide hollow structure nanoparticle in the solution treated with the ultrasonic wave. An additive quantity of the silica - titania dioxide hollow structure nanoparticle and the base is 0.01-10 parts by weight compared to the aqueous solution 100.0. The ultrasonic wave treatment is carried out with an intensity of 10-500W for 30 second -300 minutes. |
