发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD. |
摘要 |
A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate. |
申请公布号 |
NL2007634(A) |
申请公布日期 |
2012.06.15 |
申请号 |
NL20112007634 |
申请日期 |
2011.10.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SCHOOT, JAN;BOUCHOMS, IGOR;DIJSSELDONK, ANTONIUS;EURLINGS, MARKUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|