发明名称 MANUFACTURING METHOD OF NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a nonvolatile semiconductor memory device capable of suppressing power consumption and reducing switch malfunctions using a carbon nanotube as a variable resistive element. <P>SOLUTION: A manufacturing method of a nonvolatile semiconductor memory device of an embodiment includes: a step of forming a lower electrode on a semiconductor substrate 9; a step of forming a variable resistance layer 11 containing a carbon nanotube on the lower electrode; an irradiation step of irradiating the variable resistance layer with an electron beam or a photon beam; and a step of forming an upper electrode on the variable resistance layer after the irradiation step. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012114226(A) 申请公布日期 2012.06.14
申请号 JP20100261634 申请日期 2010.11.24
申请人 TOSHIBA CORP 发明人 WATANABE KATSURA;NAKAO SHINICHI;OTSUKA KENICHI
分类号 H01L27/105;H01L45/00;H01L51/05;H01L51/30 主分类号 H01L27/105
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