发明名称 |
MANUFACTURING METHOD OF NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a nonvolatile semiconductor memory device capable of suppressing power consumption and reducing switch malfunctions using a carbon nanotube as a variable resistive element. <P>SOLUTION: A manufacturing method of a nonvolatile semiconductor memory device of an embodiment includes: a step of forming a lower electrode on a semiconductor substrate 9; a step of forming a variable resistance layer 11 containing a carbon nanotube on the lower electrode; an irradiation step of irradiating the variable resistance layer with an electron beam or a photon beam; and a step of forming an upper electrode on the variable resistance layer after the irradiation step. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012114226(A) |
申请公布日期 |
2012.06.14 |
申请号 |
JP20100261634 |
申请日期 |
2010.11.24 |
申请人 |
TOSHIBA CORP |
发明人 |
WATANABE KATSURA;NAKAO SHINICHI;OTSUKA KENICHI |
分类号 |
H01L27/105;H01L45/00;H01L51/05;H01L51/30 |
主分类号 |
H01L27/105 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|