发明名称 FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE, PROCESS FOR PRODUCING STRIP FILM FOR SEMICONDUCTOR BACK SURFACE, AND FLIP CHIP TYPE SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A semiconductor rear surface film, a manufacturing method thereof, and a flip chip type semiconductor device are provided to process a separator using silicon based remover, thereby easily delaminating the separator from the semiconductor rear surface film. CONSTITUTION: A flip chip type semiconductor rear surface film(2) is formed on the rear side of a semiconductor device. A result of dividing elongation ratio with tensile storage modulus of the flip chip type semiconductor rear surface film at 23°C is in a range of 1 to 8×103 percent/GPa. The tensile storage modulus is in a range of 0.01 to 4.0 GPa.</p>
申请公布号 KR20120062606(A) 申请公布日期 2012.06.14
申请号 KR20110074649 申请日期 2011.07.27
申请人 NITTO DENKO CORPORATION 发明人 SHIGA GOJI;TAKAMOTO NAOHIDE;ASAI FUMITERU
分类号 H01L21/301;H01L21/78 主分类号 H01L21/301
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