APPARATUS AND METHODS FOR EVAPORATION INCLUDING TEST WAFER HOLDER AND APPARATUS AND METHODS FOR DETECTING EVAPORATION CONDITIONS

摘要

Apparatus and methods for evaporating metal onto semiconductor wafers are disclosed. One such apparatus can include an evaporation chamber that includes a wafer holder and a test wafer holder that is separate and spaced apart from the wafer holder. A metal can be evaporated onto production wafers positioned in the wafer holder while metal is evaporated on a test wafer positioned in a test wafer holder. Apparatus and methods for detecting deposition conditions, such as evaporation conditions in an evaporator for evaporating metal onto semiconductor wafers, are also disclosed. One such apparatus can include a crystal monitor sensor configured to detect metal vapor associated with a metal source prior to metal deposition onto a semiconductor wafer. The apparatus can also include a shutter configured to remain in a closed position when the crystal monitor sensor detects an undesired condition, so as to prevent metal deposition onto the semiconductor wafer.