发明名称 Solid-state imaging device, manufacturing method thereof, and electronic apparatus
摘要 A solid-state imaging device includes a light blocking layer formed in an active pixel region of a pixel region on a light incident side so as to surround a photoelectric conversion unit of each pixel and formed in an extending manner to an optical black region, a concave portion formed so as to be surrounded by the light blocking layer in a region corresponding to the photoelectric conversion unit, a first refractive index layer formed on surfaces of the light blocking layer and the concave portion and having a relatively low refractive index, a second refractive index layer formed on the first refractive index layer so as to be buried in the concave portion and having a relatively high refractive index, and an anti-flare layer formed on the first refractive index layer in the optical black region.
申请公布号 US2012147208(A1) 申请公布日期 2012.06.14
申请号 US201113317465 申请日期 2011.10.19
申请人 OTSUKA YOICHI;OGINO AKIKO;SONY CORPORATION 发明人 OTSUKA YOICHI;OGINO AKIKO
分类号 H04N5/228;H01L31/0232;H01L31/18 主分类号 H04N5/228
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