发明名称 METHODS AND APPARATUS FOR THE PRODUCTION OF HIGH PURITY SILICON
摘要 <p>Methods and apparatus for the production of high purity silicon including a silicon deposition reactor with a gas distribution plate for injecting gas into the silicon deposition reactor.</p>
申请公布号 WO2012078198(A1) 申请公布日期 2012.06.14
申请号 WO2011US23984 申请日期 2011.02.08
申请人 SILIKEN CHEMICALS, S.L.;VALES CANLE, MANUEL VINCENTE;TOMAS MARTINEZ, MARIA;SAN-SEGUNDO SANCHEZ, JAVIER;BETHARDS, MATTHEW S.;REL, XAVIER, BENAVIDES 发明人 VALES CANLE, MANUEL VINCENTE;TOMAS MARTINEZ, MARIA;SAN-SEGUNDO SANCHEZ, JAVIER;BETHARDS, MATTHEW S.;REL, XAVIER, BENAVIDES
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址
您可能感兴趣的专利