发明名称 |
ION MILLING APPARATUS AND ION MILLING PROCESSING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To prepare a sample cross section that is desired for the observation and analysis and suppresses generation of void and unevenness derived from a dissimilar material in preparation of a cross-sectional sample. <P>SOLUTION: Tilt oscillation is performed on a sample 3 for optical axis (Z-axis) of ion beam 2, and the ion beam 2 is radiated to a processing surface 3a at low angle by repeating inclination and inclination recovery between a surface condition where the processing surface 3a of the sample 3 is oriented to an inclined axis direction (Y-axis direction) and a tilt surface condition where a sample stand side portion of the processing surface 3a projects to the inclined axis direction (Y-axis direction) with compared to a mask side portion of the processing surface 3a, from the surface condition, thereby suppressing void 61 and unevenness 63 derived from a dissimilar material 62. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012113865(A) |
申请公布日期 |
2012.06.14 |
申请号 |
JP20100260134 |
申请日期 |
2010.11.22 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
WATANABE TOSHIYA;KOI ASAMI;TAKASU HISAYUKI;UENO ATSUSHI |
分类号 |
H01J37/305;G01N1/28;H01J37/20;H01J37/31 |
主分类号 |
H01J37/305 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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