| 摘要 |
PURPOSE: An X-ray diffraction instrument and a method for measuring the X-ray diffraction are provided to visualize transparent materials by an X-ray topograph and to measure the X-rays after specifically setting an arbitrary position within a planar region of the X-ray topograph by using coordinates. CONSTITUTION: An X-ray diffraction instrument(1) comprises an X-ray topography unit, an optical photographing unit(6), and an image synthesizing unit. The X-ray topography unit detects X-rays irradiated from a planar region of a sample(18) as a planar X-ray topograph, thereby outputting the X-ray topograph as signals. The optical photographing unit collects ore deposits of the planar region of the sample and outputs the ore deposits as specified signals by planar position information. The image synthesizing unit generates composition image data based on output signals of the optical photographing unit and X-ray topograph. |
