| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition containing a base generating agent that has high solubility with various kinds of organic solvents and does not accompany generation of carbon dioxide gas upon generating a base by irradiation with active energy rays. <P>SOLUTION: A photosensitive resin composition which contains a base generating agent expressed by a general formula [1] and a base reactive resin, and a method for forming a pattern by using the composition are provided. In the formula, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each represents a hydrogen atom, 1-10C straight-chain, branched or cyclic alkyl group, phenyl group or cyano group; R<SP POS="POST">3</SP>to R<SP POS="POST">6</SP>each represents a hydrogen atom, halogen atom, 1-10C straight-chain, branched or cyclic alkyl group, 1-10C straight-chain, branched or cyclic alkoxy group, 6-10C aryl group, hydroxyl group, or nitro group; Z represents a group derived from a primary or secondary amine; and R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>may form a cyclic structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
