| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing device having a process gas discharge part which changes a discharge position of the process gas without manually conducting position change or replacement of an annular partition wall member or replacing a process gas discharge part itself. <P>SOLUTION: A processing device comprises: a process gas discharge part 5 provided in a processing chamber so as to face a mounting table and having process gas discharge holes 16 which are divided from each other through inner partition walls 14; and a process gas distribution unit 12 that includes process gas distribution pipes 18a to 18i communicating with a first space 15a corresponding to a center part, out of a surface of a work piece, a second space 15i corresponding to an edge part, out of the surface of the work piece, and at least one of third spaces 15b to 15h provided between the first space 15a and the second space 15i; and valves 19a to 19h respectively opening and closing paths between the adjacent process gas distribution pipes 18a and 18i. <P>COPYRIGHT: (C)2012,JPO&INPIT |
