发明名称 Positioning System, Lithographic Apparatus and Device Manufacturing Method
摘要 A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
申请公布号 US2012147355(A1) 申请公布日期 2012.06.14
申请号 US201213398890 申请日期 2012.02.17
申请人 BUTLER HANS;CUIJPERS MARTINUS AGNES WILLEM;HOOGENDAM CHRISTIAAN ALEXANDER;DE JONGH ROBERTUS JOHANNES MARINUS;RENKENS MICHAEL JOZEF MATHIJS;VAN DER WIJST MARC WILHELMUS MARIA;WIJCKMANS MAURICE WILLEM JOZEF ETIENNE;TOUSAIN ROBERTUS LEONARDUS;FAASSEN RONALD PETRUS HENDRICUS;KOEVOETS ADRIANUS HENDRIK;ASML NETHERLANDS B.V. 发明人 BUTLER HANS;CUIJPERS MARTINUS AGNES WILLEM;HOOGENDAM CHRISTIAAN ALEXANDER;DE JONGH ROBERTUS JOHANNES MARINUS;RENKENS MICHAEL JOZEF MATHIJS;VAN DER WIJST MARC WILHELMUS MARIA;WIJCKMANS MAURICE WILLEM JOZEF ETIENNE;TOUSAIN ROBERTUS LEONARDUS;FAASSEN RONALD PETRUS HENDRICUS;KOEVOETS ADRIANUS HENDRIK
分类号 G03B27/58 主分类号 G03B27/58
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