发明名称 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
摘要 A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si3N4, silicon dioxide SiO2, or silicon carbide SiC.
申请公布号 US2012147350(A1) 申请公布日期 2012.06.14
申请号 US201013381312 申请日期 2010.05.11
申请人 YAKUNIN ANDREI;BANINE VADIM;GLUSHKOV DENIS;ASML NETHERLANDS B.V 发明人 YAKUNIN ANDREI;BANINE VADIM;GLUSHKOV DENIS
分类号 G03B27/72;G02B5/22;H01L21/302 主分类号 G03B27/72
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