发明名称 |
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER |
摘要 |
A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si3N4, silicon dioxide SiO2, or silicon carbide SiC. |
申请公布号 |
US2012147350(A1) |
申请公布日期 |
2012.06.14 |
申请号 |
US201013381312 |
申请日期 |
2010.05.11 |
申请人 |
YAKUNIN ANDREI;BANINE VADIM;GLUSHKOV DENIS;ASML NETHERLANDS B.V |
发明人 |
YAKUNIN ANDREI;BANINE VADIM;GLUSHKOV DENIS |
分类号 |
G03B27/72;G02B5/22;H01L21/302 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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