| 摘要 |
<p>Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.</p> |
