| 摘要 |
PURPOSE: A multi-gray scale photo mask, a blank photo mask, and a pattern transcription method are provided to reduce manufacturing defects by limiting variations of a transmission rate over the wave length of line I to line g. CONSTITUTION: A half transmitting film(22) which transmits a part of the exposure light to a light-transmitting substrate(21) and a light-shielding layer(30) which shields the exposure light are formed. In a partial penetration, the light shielding portion shielding the half light-transmitting part and the exposure light is formed on the light-transmitting part which transmits the exposure light by enforcing the respective patterning to the half transmitting film and the light-shielding layer. The half transmitting film comprises a laminated film(24) of more than two half transmitting film which have a different transmission rate for the exposure light. The transmittance of the exposure light which transmits the half transmitting film by adjusting the film thickness of one half transmitting film comprising a lamination film, is adjusted to a desired value.
|
