| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for calculating the displacement of an illuminance unevenness sensor by estimating illuminance distribution with fewer measurement (two or more measurements by step drive in a scanning direction). <P>SOLUTION: In order to measure illuminance distribution on a slit illumination region and an exposure surface, an exposure device includes an illuminance unevenness sensor for placing a light-receiving surface of the illuminance unevenness sensor to the exposure surface and moving along the exposure surface, and performs step movement on the exposure surface in the scanning direction on at least two positions in a circular-shaped slit so that the illuminance distribution in the scanning direction can be measured. The exposure device measures illuminance distribution on at least two multiple steps, approximates the illuminance distribution to multinomial by least square method and detects displacement from Y difference (difference in the scanning direction) possible to calculate from apex coordinates of each illuminance distribution against the illuminance unevenness sensor in an X direction (direction orthogonal to the scan). <P>COPYRIGHT: (C)2012,JPO&INPIT |
