发明名称 |
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).
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申请公布号 |
US2012148956(A1) |
申请公布日期 |
2012.06.14 |
申请号 |
US201113313990 |
申请日期 |
2011.12.07 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
UTSUMI YOSHIYUKI;TAKESHITA MASARU;SHIMIZU HIROAKI;ABE SYO;KOMURO YOSHITAKA |
分类号 |
G03F7/20;G03F7/004;G03F7/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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