| 摘要 |
<p>This invention provides a polishing slurry that can mitigate roughness of the finished surface and surface unevenness in the fabrication of a glass substrate, and provides a polishing composition used to prepare the polishing slurry. This composition for polishing a glass substrate and the polishing slurry which contains abrasive grains and the polishing composition include components (A), (B), and as required, (C) and/or (D), where (A) is a tetrazole derivative having at least one group selected from a mercapto group, an alkylthio group, and an alkyl group, (B) is water, (C) is a polysaccharide, and (D) is an amine.</p> |
