| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method for substrate processing which suppress foam phenomena of an exposed photosensitive resin material. <P>SOLUTION: A substrate processing system 1 includes a cleaning device 21, a resist application device 22, a periphery exposure device 23, a substrate transfer mechanism 30, and a system controller 10. The system controller 10 has a waiting period monitoring part 10B monitoring a waiting period of a substrate W, which starts when a resist film is formed by the resist application device 22 and ends when an exposure process is started by the periphery exposure device 23, and a process control part 10A causing the substrate transfer mechanism 30 to transfer the substrate W to the cleaning device 21 when the waiting period exceeds a time limit. The process control part 10A causes the substrate W in which the resist film is removed by the cleaning device 21 to be transferred to the resist application device 22. <P>COPYRIGHT: (C)2012,JPO&INPIT |
