| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem of a liquid supply device of a resist development apparatus or the like where temperature fluctuation of a liquid actually supplied to a base substance hinders stability of processing. <P>SOLUTION: A resist development apparatus 1 according to the present invention includes: a hermetic type storage part 4 for storing a developing solution 11 controlled to a constant temperature state; a holding part 8 for holding a processing target substrate 6 to which the developing solution 11 stored in the storage part 4 is supplied; a supply pipe 5 that is arranged to be led out from the inside of the storage part 4 to the outside of the storage part 4, includes a led-out portion arranged to extend to a position facing the holding part 8, and supplies the developing solution 11 in the storage part toward the processing target substrate 6 held by the holding part 8; and an on-off valve 15 that is an accessory member accessorily provided midway through the arrangement of the supply pipe 5, wherein the on-off valve 15 is disposed inside the storage part 4. <P>COPYRIGHT: (C)2012,JPO&INPIT |
