| 发明名称 |
SUBSTRATE PROCESSING APPARATUSES AND SYSTEMS |
| 摘要 |
A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector. |
| 申请公布号 |
US2012148744(A1) |
申请公布日期 |
2012.06.14 |
| 申请号 |
US201113193498 |
申请日期 |
2011.07.28 |
| 申请人 |
COLVIN RONALD L.;GOODWIN, SR. DENNIS;MITTENDORF JEFF;MORETTI CHARLES J.;ROSE JOHN W.;SAMUELS EARL BLAKE |
发明人 |
COLVIN RONALD L.;GOODWIN, SR. DENNIS;MITTENDORF JEFF;MORETTI CHARLES J.;ROSE JOHN W.;SAMUELS EARL BLAKE |
| 分类号 |
C23C16/46;C23C16/02 |
主分类号 |
C23C16/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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