METHODS AND APPARATUS FOR INTEGRATING AND CONTROLLING A PLASMA PROCESSING SYSTEM

摘要

Methods and apparatus for controlling a plasma processing system in a purely pull mode or a hybrid pull mode, in the purely pull mode, the back end assumes master control at least for requesting and scheduling loading of production wafers. In the hybrid pull mode, the back end assumes master control at least for tool maintenance/cleaning while the front end retains master control for production wafers.