| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask suitably used in manufacturing a circuit board required to have high definition such as a printed wiring board, and to provide a photomask with a small environmental load that may be provided with a degradable property such as a biodegradable property and may be disposed of through an alkaline treatment. <P>SOLUTION: A photomask comprises at least one layer of a film containing polyglycolic acid including 70 mol% or more of a glycolic acid repeating unit represented by a formula, -(O-CH<SB POS="POST">2</SB>-CO)-. Alternatively, a photomask comprises a laminated film composed of a film including polyglycolic acid and a film including another thermoplastic resin. In a method for manufacturing a circuit board, any of these photomasks is used. <P>COPYRIGHT: (C)2012,JPO&INPIT |
