发明名称 |
METHOD FOR FABRICATING TRENCH ISOLATION STRUCTURE |
摘要 |
A method for fabricating a trench isolation structure is described. A trench is formed in a substrate. A liner layer is formed at least in the trench. A precursor layer is formed at least on the sidewalls of the trench. The precursor layer is converted to an insulating layer that has a larger volume than the precursor layer and fills up the trench.
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申请公布号 |
US2012149172(A1) |
申请公布日期 |
2012.06.14 |
申请号 |
US20100962655 |
申请日期 |
2010.12.08 |
申请人 |
HUANG JEN-JUI;TSAI HUNG-MING;NANYA TECHNOLOGY CORPORATION |
发明人 |
HUANG JEN-JUI;TSAI HUNG-MING |
分类号 |
H01L21/31 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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