发明名称 METHOD FOR FABRICATING TRENCH ISOLATION STRUCTURE
摘要 A method for fabricating a trench isolation structure is described. A trench is formed in a substrate. A liner layer is formed at least in the trench. A precursor layer is formed at least on the sidewalls of the trench. The precursor layer is converted to an insulating layer that has a larger volume than the precursor layer and fills up the trench.
申请公布号 US2012149172(A1) 申请公布日期 2012.06.14
申请号 US20100962655 申请日期 2010.12.08
申请人 HUANG JEN-JUI;TSAI HUNG-MING;NANYA TECHNOLOGY CORPORATION 发明人 HUANG JEN-JUI;TSAI HUNG-MING
分类号 H01L21/31 主分类号 H01L21/31
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