发明名称 VACUUM HEAT TREATMENT APPARATUS
摘要 PURPOSE: A vacuum heat treatment apparatus is provided to obtain a material with a uniform grain size by evenly discharging gas from the upper and lower parts of a reaction container. CONSTITUTION: A vacuum heat treatment apparatus comprises a chamber, a reaction container(32) located in the chamber, and a heating member heating the reaction container inside the chamber. A lower exhaust channel(324) is formed in the lower part of a side wall of the reaction container.
申请公布号 KR20120062572(A) 申请公布日期 2012.06.14
申请号 KR20100123882 申请日期 2010.12.06
申请人 LG INNOTEK CO., LTD. 发明人 HAN, JUNG EUN;KIM, YOUNG NAM;CHAI, KYOUNG HOON
分类号 C21D1/773;F27B14/04;F27D7/06 主分类号 C21D1/773
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