发明名称 |
VACUUM HEAT TREATMENT APPARATUS |
摘要 |
PURPOSE: A vacuum heat treatment apparatus is provided to obtain a material with a uniform grain size by evenly discharging gas from the upper and lower parts of a reaction container. CONSTITUTION: A vacuum heat treatment apparatus comprises a chamber, a reaction container(32) located in the chamber, and a heating member heating the reaction container inside the chamber. A lower exhaust channel(324) is formed in the lower part of a side wall of the reaction container. |
申请公布号 |
KR20120062572(A) |
申请公布日期 |
2012.06.14 |
申请号 |
KR20100123882 |
申请日期 |
2010.12.06 |
申请人 |
LG INNOTEK CO., LTD. |
发明人 |
HAN, JUNG EUN;KIM, YOUNG NAM;CHAI, KYOUNG HOON |
分类号 |
C21D1/773;F27B14/04;F27D7/06 |
主分类号 |
C21D1/773 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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