| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device in which relative position error between stages occurring due to elastic deformation of the body structure is corrected without requiring an extra laser interferometer for measuring elastic deformation of the body structure. <P>SOLUTION: An exposure device 1 comprises a mask stage 4 which holds a mask 2, a plate stage 5 which holds a substrate 3, a laser interferometer for measuring the positions of the mask stage 4 and the plate stage 5, a control arithmetic unit 16 and a driver which control the positions of the mask stage 4 and the plate stage 5 based on the measurement results of the laser interferometer, and a projection optical system 6 which projects a pattern drawn on a mask 2 to the substrate 3. Tilt amounts of a laser interferometer support base on the body structure 7 and the projection optical system 6 are measured by tilt angle meters 17(a), 17(b), 17(c), and relative position error of the mask stage 4 and the plate stage 5 is corrected from the measurement results. <P>COPYRIGHT: (C)2012,JPO&INPIT |
