| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etching apparatus which prevents air bubbles departing from a semiconductor substrate (a solar cell) from adhering to the semiconductor substrate again and causing non-uniform etching and shape defects. <P>SOLUTION: A wet etching apparatus includes: an etching bath 5 accumulating an etching solution 4 in which a solar cell 2 is immersed; a circulation water passage system 20A which recovers the etching solution 4 on an upper layer of the etching bath 5 and ejects the recovered etching solution 4 from a bottom part of the etching bath 5 to circulate the etching solution 4 in the etching bath 5; and an air bubble capturing collector 1A which is immersed between the solar cell 2 and a liquid surface of the etching solution 4 in the etching bath 5 to capture and collect air bubbles 7 generated from the solar cell 2 and floating in the etching bath 5. <P>COPYRIGHT: (C)2012,JPO&INPIT |
