| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sample holding method preventing reflected and scattered electrons by a sample support holding a sample piece from abutting on the sample piece easily. <P>SOLUTION: A sample holding method includes steps of: irradiating a focused ion beam 2 on a sample material 1 to cut out a sample piece 4; attaching the cut out sample piece 4 to a distal end of a probe 5 that is mounted on a tip of a manipulator and picking the sample piece up; setting a sample support member 7 on a sample stage of a focused ion beam apparatus, the sample support member 7 is to be set on a sample holder of an electronic microscope instead of the sample material 1; moving the probe 5 such that the sample piece 4 attached to the distal end of the probe 5 is positioned in a space apart from the sample support member 7 and a part of the probe 5 comes into contact with the sample support member 7; attaching a part of the probe 5 to the sample support member 7 at the contacting part; and cutting off a part of the probe 5 closer to root thereof with respect to the contacting part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
