摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem, wherein an SOG film is soluble in an ink unlike an insulating layer formed by a sputtering method or a chemical vapor deposition method, so that an insulating layer or the like may peel from that part due to elution if the SOG film is exposed to a flow channel of the ink even at one part. <P>SOLUTION: An SOG layer 16 is etched until a flat part of a second insulating layer 15 is exposed, and a part 16a relaxing the inclination made of the SOG material is located at only a corner part of the second insulating layer 15 with a recessed and protruding shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |