发明名称 |
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING RESIN HAVING ALIPHATIC RING AND AROMATIC RING |
摘要 |
<p>There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1):
(T is a repeating unit structure containing an alicyclic ring in the polymer main chain; and E is an epoxy group or an organic group containing an epoxy group). The condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B) may include a condensed-ring aromatic carboxylic acid (B1) and a monocyclic aromatic carboxylic acid (B2) in a molar ratio of B1:B2 = 3:7 to 7:3. The condensed-ring aromatic carboxylic acid (B1) may be 9-anthracenecarboxylic acid and the monocyclic aromatic carboxylic acid (B2) may be benzoic acid.</p> |
申请公布号 |
KR20120062701(A) |
申请公布日期 |
2012.06.14 |
申请号 |
KR20127003293 |
申请日期 |
2010.08.11 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
SHINJO TETSUYA;NISHIMAKI HIROKAZU;SAKAIDA YASUSHI;HASHIMOTO KEISUKE |
分类号 |
G03F7/11;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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