| 摘要 |
<p>PURPOSE: A temperature control method of a chemical vapor deposition apparatus is provided to improve reliability of a measurement value of a temperature sensor using a value measured by an encoder included in a motor for rotating a susceptor. CONSTITUTION: A susceptor is located inside a chamber in order to be able to rotate. A gas supply part sprays gas toward a wafer arranged inside the chamber. A plurality of heaters(50a,50b) heats the wafer by being arranged inside the susceptor. Temperature sensors(20a,20b) measure a temperature of the upper surface of the susceptor by being arranged on the upper side of the chamber. The temperature distribution of the susceptor is calculated based on a measured value of the temperature sensor. A heater controller(71) individually controls the plurality of heaters.</p> |
