发明名称 NON-VOLATILE MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
摘要 A non-volatile memory device comprises a substrate, a control gate electrode on the substrate, and a charge storage region between the control gate electrode and the substrate. A control gate mask pattern is on the control gate electrode, the control gate electrode comprising a control base gate and a control metal gate on the control base gate. A width of the control metal gate is less than a width of the control gate mask pattern. An oxidation-resistant spacer is at sidewalls of the control metal gate positioned between the control gate mask pattern and the control base gate.
申请公布号 US2012146125(A1) 申请公布日期 2012.06.14
申请号 US201113212639 申请日期 2011.08.18
申请人 KIM MINCHUL;SIM JAE-HWANG;SONG SANGBIN;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM MINCHUL;SIM JAE-HWANG;SONG SANGBIN
分类号 H01L29/788 主分类号 H01L29/788
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