| 摘要 |
The embodiment of the invention provides a manufacturing method for a thin film transistor liquid crystal display (TFT-LCD) array substrate, the manufacturing method comprises: step 1, depositing a transparent conductive film, a source/drain metal film and a doped semiconductor film on a transparent substrate sequentially, forming patterns of a doped semiconductor layer, a source electrode and a drain electrode of a thin film transistor, a data line and a pixel electrode by a first patterning process, wherein the doped semiconductor layer remains on the source electrode and the drain electrode; Step 2, depositing a semiconductor film on the whole transparent substrate after Step 1, forming a pattern of a semiconductor layer which includes a channel of the thin film transistor by a second patterning process; Step 3, depositing an insulating film and a gate metal film on the whole transparent substrate after Step 2, forming patterns of a gate line and a gate electrode of the thin film transistor by a third patterning process, wherein the gate electrode is located above the channel of the thin film transistor. |
