发明名称 |
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
<p>An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.</p> |
申请公布号 |
EP2126636(B1) |
申请公布日期 |
2012.06.13 |
申请号 |
EP20080715667 |
申请日期 |
2008.01.30 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
DIECKMANN, NILS;MAUL, MANFRED;HETTICH, CHRISTIAN;NATT, OLIVER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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