| 摘要 |
PURPOSE: A cleaning unit of a substrate and an apparatus for cleaning a substrate having the same are provided to remove a foreign material by maximizing the contact area and probability of the cleaning unit of a substrate without additional setting of the cleaning unit. CONSTITUTION: In a cleaning unit of a substrate and an apparatus for cleaning a substrate having the same, a body(110) is extended to the width of a substrate and has a plurality of slots in zig-zag type. Elastic supports(120) are received in the slots respectively and includes an elastic material. A plurality of cleaning blades(130) are installed in the elastic supports and are contacted to the surface of the substrate to remove the foreign material from the surface of the substrate.
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