Apparatus for manufacturing a directional layer by means of cathodic sputtering and its use

摘要

u The cathode sputtering process involves sputtering onto a substrate surface (4) so that particles from the target surface (6) are incident from directions for which the substrate surface is in a preferred angular sector, by arranging a collimator (8) with its plates perpendicular to the substrate surface and parallel to the labeled direction. Alternatively or additionally, the position or movement of the substrate surface with respect to the target surface can be adjusted or controlled appropriately.