Thin-film deposition apparatus and method for depositing thin-film
摘要
<p>PURPOSE: A thin film deposition apparatus and a thin film deposition method thereof are provided to reduce manufacturing costs without using a tray for loading a substrate in the thin film deposition apparatus. CONSTITUTION: A process chamber(110) comprises a substrate transfer unit which transfers a substrate while being connected to the substrate. A thin film deposition process for depositing a thin film on the substrate is performed inside the process chamber. An insertion load lock chamber(120) is connected to one side of the process chamber while arranging a first entrance between the insertion load lock chamber and the process chamber. An insertion substrate transfer unit is arranged inside the insertion load lock chamber. An ejection load lock chamber(130) comprises an ejection substrate transfer unit for transferring the substrate while being connected to the substrate.</p>
申请公布号
KR20120061731(A)
申请公布日期
2012.06.13
申请号
KR20110101550
申请日期
2011.10.06
申请人
JUSUNG ENGINEERING CO., LTD.
发明人
LEE, JEONG BEOM;KIM, JOUNG SIK;KIM, HYUNG SEOK;YOO, JIN HYUK;HA, JUNG MIN;HUH, SON WHE