| 摘要 |
PURPOSE: An active ray-sensitive or radiation-sensitive resin composition, a resist film using the same, and a method for forming the patterns are provided to prevent the generation of development defects in case of electron-beam exposure. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin. The resin includes a repeating unit represented by chemical formula I or II, a repeating unit generating alkali soluble groups, and a repeating unit represented by chemical formula X. The repeating unit represented by chemical formula I or II generates acid anions at the side chain of the resin according to the decomposition of acid ray or radiation ray irradiation. The repeating unit generating the alkali soluble groups is based on the action of acid.
|
