.

摘要

PURPOSE: A three-dimensional polymer metal film forming apparatus and method using a linear CVD(Chemical Vapor Deposition) source and sputtering of an electron beam are provided to improve the adhesion, uniformity, and flatness of a metal film by eliminating impurities before forming the metal film on polymer. CONSTITUTION: A three-dimensional polymer metal film forming apparatus comprises a processing chamber(30), a linear CVD source feeder, an electron beam sputter source feeder(34), a magnetron(35), and a grid part(31). The processing chamber forms a metal film seed layer on polymer(1) and forms a metal film. The linear CVD source feeder provides first metal ion into the processing chamber. The electron beam sputter feeder creates second metal ion by shooting an electron beam to a sputter source in the processing chamber. The magnetron increases the activity of the first and second metal ion. The grid part comprises two grids which are arranged at an interval in the processing chamber to collect the first and second metal activated by power provided from a power supply and inject the metal ion into the polymer between the grids.