发明名称 REPLACEABLE UPPER CHAMBER PARTS OF PLASMA PROCESSING APPARATUS
摘要 An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.
申请公布号 KR20120004158(U) 申请公布日期 2012.06.12
申请号 KR20117000004U 申请日期 2010.09.10
申请人 发明人
分类号 H01L21/3065;H01L21/205 主分类号 H01L21/3065
代理机构 代理人
主权项
地址