| 摘要 |
<p>PURPOSE: A wafer track device and a photoresist coating method using the same are provided to prevent photoresists from being deposited on the side of a bowl by spraying cleaning solutions on the side of the bowl through a chemical slit. CONSTITUTION: A wafer(300) is mounted inside a bowl(100). A rotation motor(800) rotates a spin chuck. A photoresist supply unit(400a,400b,400c) sprays photoresists on the wafer. A cleaning solution supply unit(500a,500b,500c,500d) sprays cleaning solutions on the bowl. A control unit(900) controls the cleaning solution supply unit and the photoresist supply unit.</p> |
