发明名称 Device for Selective Micro-Pattern Forming Using Ultrasonic Wave and Method Performed by the Same Deltrasonic Wave and Method Performed by the Same Device
摘要 <p>PURPOSE: A selective fine pattern molding apparatus which uses ultrasonic waves and a method thereof are provided to reduce costs required for forming various fine pattern shapes by enabling replacement of a masking layer without reprocessing a mold or a tool horn. CONSTITUTION: A mold(20) fixes a processed substrate(10). A second pattern(220) is formed on a region of the mold corresponding to a predetermined region. The processed substrate is fixed on the mold by a fixing device(50). A masking layer(30) is comprised of a masking region(35) and a non-masking region(37). A tool horn(40) transfers ultrasonic vibrations to the masking layer.</p>
申请公布号 KR101151220(B1) 申请公布日期 2012.06.11
申请号 KR20120037170 申请日期 2012.04.10
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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