| 摘要 |
The invention provides a cover fixer and a cover fixing device for an inductively coupled plasma processing device, which prevents damage on a lower surface of a window member and generation of particles in the inductively coupled plasma processing device and is easy to detach. An dielectric cover of the inductively coupled plasma processing device includes a supported portion which has the low surface and a side end connected with the lower surface. An dielectric cover fixer includes a supporting portion which is abutted against the lower surface of the supported portion and is clamped between either the supported portion and a supporting beam of a supporting member for supporting a dielectric wall or the supported portion and the dielectric wall for supporting the supported portion; and a fixed portion which is connected with the supporting portion, a part of which is arranged on the side of the side end of the supported portion and is fixed in a way not shifting with respect to the supporting beam.
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