发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
<p>A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.</p> |
申请公布号 |
NL2007789(A) |
申请公布日期 |
2012.06.11 |
申请号 |
NL20112007789 |
申请日期 |
2011.11.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZWET, ERWIN;JAGER, PIETER;ONVLEE, JOHANNES;MAN, HENDRIK |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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