| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for transferring a mask pattern while reducing variation in electrical characteristic in a wafer. <P>SOLUTION: A transparent EL display 14 displays a mask pattern. An exposure part 16 transfers the mask pattern onto a mask via the transparent EL display 14. A mask pattern switching part 13 switches at least two different mask patterns, and controls so that the different mask patterns are displayed on the transparent EL display 14 and the different mask patterns are transferred onto the same wafer 2. Thus, the mask pattern can be transferred while the variation in electrical characteristic in the wafer 2 is reduced. <P>COPYRIGHT: (C)2012,JPO&INPIT |
