发明名称 METHOD OF PRODUCING PIEZOELECTRIC FILM, PIEZOELECTRIC ELEMENT AND LIQUID EJECTION HEAD AND LIQUID EJECTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of producing a piezoelectric film which allows for production of a piezoelectric film having a large amount of strain. <P>SOLUTION: The method of producing a piezoelectric film includes a step for forming a piezoelectric precursor film by a composition for forming a piezoelectric film which contains Bi, Fe, Mn, Ba and Ti where the Bi/(Fe+Mn), i.e. the mole ratio of Bi and the total amount of Fe and Mn, is 1.02-1.08, and a step for crystallizing the piezoelectric precursor film by heating. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012109361(A) 申请公布日期 2012.06.07
申请号 JP20100256346 申请日期 2010.11.16
申请人 SEIKO EPSON CORP 发明人 SAKAI TOMOHIRO
分类号 B41J2/055;B41J2/045;B41J2/135;B41J2/14;B41J2/16;H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/317;H01L41/39;H01L41/43 主分类号 B41J2/055
代理机构 代理人
主权项
地址