发明名称 GAP TUNING FOR SURFACE MICROMACHINED STRUCTURE IN EPITAXIAL REACTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for tuning a gap between a plurality of surfaces of at least one micromechanical element on a device. <P>SOLUTION: The method includes: etching a contour of the at least one micromechanical element in a top layer of the device so that the contour defines at least two opposing surfaces of the plurality of surfaces of the at least one micromechanical element; and depositing a gap narrowing layer on the at least two opposing surfaces of the plurality of surfaces in an epitaxial reactor so that the gap between the at least two opposing surfaces of the plurality of surfaces can be narrowed by the gap narrowing layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012106340(A) 申请公布日期 2012.06.07
申请号 JP20120054950 申请日期 2012.03.12
申请人 ROBERT BOSCH GMBH 发明人 PARTRIDGE AARON;LUTZ MARKUS
分类号 B81C1/00;B81B3/00;B81C99/00 主分类号 B81C1/00
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