| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus which performs drawing in high accuracy while achieving high speed operation by using a GPU. <P>SOLUTION: A lithography apparatus 100 comprises a plurality of GPUs 42, 44 performing the same data processing, a CPU 30 performing the same data processing as that of the plurality of GPUs, a GPU result comparison unit which compares the output results from the plurality of GPUs, a correction unit 126 which calculates the drawing position on a sample by using one of the output results from the plurality of GPUs when the output results from the plurality of GPUs match each other, otherwise by using the output results from the CPU, and a lithography unit 150 which draws a pattern at the drawing position by using an electron beam. <P>COPYRIGHT: (C)2012,JPO&INPIT |
